Our equipment is specialized on fabrication and analyzation of nanometer sized metallic structures. Please find further information on the following detail pages:

Further devices are located in the shared Nanolab facility:

  •  Zeiss CrossBeam 1540XB: E-Beam Lithography and FIB Milling
  • Karl Süss MJB 3 Mask Aligner: Optical Lithography
  • Sentech SI 220: Reactive Ion Etching
  • tpt Wire Bonder HB06
  • nanofilm Ellipsometer EP3
  • Bal-Tec CPD 030 Critical Point Dryer
  • Chemical Hoods

A full list of the available equipment in the Nanolab can be found on the Nanolab website.