Linear evaporator with Pd, Au, Ti and Al crucibles (left to right).

Two UHV thin film deposition machines using electron beam and thermal evaporation to deposit clean metal films with nanometer precision. The machines can be used with shadow evaporation and can be heated by electric currents or cooled by liquid nitrogen to achieve best results. The base pressure is around 10-9 mbar which allows the fabrication of very clean films.